|
|
|
篇目详细内容 |
|
【篇名】 |
Patterning graphene nanostripes in substrate-supported functionalized graphene: A promising route to integrated, robust, and superior transistors |
|
【刊名】 |
Frontiers of Physics |
|
【刊名缩写】 |
Front. Phys |
|
【ISSN】 |
2095-0462 |
|
【EISSN】 |
2095-0470 |
|
【DOI】 |
10.1007/s11467-011-0239-3 |
|
【出版社】 |
Higher Education Press and Springer-Verlag Berlin
Heidelberg |
|
【出版年】 |
2012 |
|
【卷期】 |
7
卷3期 |
|
【页码】 |
324-327
页,共
4
页 |
|
【作者】 |
Liang-feng Huang;
Zhi Zeng;
|
|
【关键词】 |
graphene nanostripe; functionalized graphene; field-effect transistor |
【摘要】 |
|
It is promising to apply quantum-mechanically confined graphene systems in field-effect transistors. High stability, superior performance, and large-scale integration are the main challenges facing the practical application of graphene transistors. Our understandings of the adatom-graphene interaction combined with recent progress in the nanofabrication technology indicate that very stable and high-quality graphene nanostripes could be integrated in substrate-supported functionalized (hydrogenated or fluorinated) graphene using electron-beam lithography.We also propose that parallelizing a couple of graphene nanostripes in a transistor should be preferred for practical application, which is also very useful for transistors based on graphene nanoribbon. |
|
